PhotoResist Stripping

The finer lines and spaces now common in the industry are putting more demands on existing resist stripping technology. Generic chemistries have long suffered in fine line and overplated applications and are notorious for their high metal corrosion rates which can lead to tin transfer and etch retardation. The Atotech ResistStrip series have been carefully formulated to minimise swelling for fine line applications with additives to essentially stop corrosive attack on board features.

ResistStrip

The extensive range of ResistStrip products ensures that Atotech have a resist stripper for every application. The product range is based on modified hydroxides and amine solutions to guarantee enhanced stripping performance with minimal corrosive attack.

ResistStrip IC-1

ResistStrip IC-1 is the next evolution of the fine line product ResistStrip IC and has been specially formulated to meet the demands of ultrafine line dry film stripping in a single process step. The traditional stripping mechanism has been modified to essentially stop the film swelling that leads to lock in and dry film residues in fine line applications, with minimal attack and no undercut of the SAP electroless base layer

Hi-Flo Resist Filtration

The newly redesigned Atotech Hi-Flo resist filter can be added to any existing film stripping line. Through their inclined mesh technology, their use significantly improves solution life, process efficiency and performance processes. The Hi-Flo range of filters are fully compatible with the ResistStrip series and offer the complete systems approach to dry and liquid film removal.

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