ResistStrip

Alkaline solutions have been widely used for the removal of dry and liquid film photo resists, and as a key company involved in these, Atotech have an excellent understanding of the main stripping mechanisms and how we can manipulate this to achieve different stripping performance.  

Generally the stripping mechanism generates a degree of swelling in the film prior to its removal, at Atotech we believe that reducing this effect greatly improves the performance and this becomes more evident at finer line and spaces.  The ResistStrip series has been in long time volume production around the world proves that this concept is successful.  When formulating the ResistStrip series our chemists also consider the additions of corrosion inhibitors and Copper passivators to ensure a clean surface and mild defoaming agents to help with easy process control.

With a wide range of carefully formulated resist strippers available we have a product for every situation.

Features and Benefits

• No attack on tin or tin/lead etch resists
• Controlled swelling of the resist, therefore tolerance to overplate
• Improved AOI capability on copper
• Improved etching accuracy as no surface oxidation or tin transfer
• Maximum utilization and extended bath life of the process chemistry
• Reduced water consumption
• Automatic process control and chemical inventory management
• Improved productivity with consistent product quality via steady-state operation