Liquid Photoimageable Etch Resist

APR series products belong to the Liquid Primary Imaging Resist (LPIR) range, they are negative working Liquid Etch Resists designed to be robust and tolerant in order to support excellent First Pass Yield to our partners. Enhanced photospeed, ultra-high contrast and resolution capability are only few of the winning characteristics of Atotech APR liquid photoimageable etch resist series.
APR products show excellent coating performance on both Vertical and Horizontal Roller Coater equipment.
(For more information on APR etch resists please see under Contacts).

Liquid Photoimagable Etch Resist

The APR series has been formulated with capability and yield at the forefront. Tolerant and robust in all aspects it widens process tolerances while achieving resolution capability well in advance of current industry requirements.

APR 58 URC-1 HV provides excellent performance within widest processing windows, which makes it the first choice for high throughput / high yield innerlayer manufacturing.
APR 68 has been engineered to provide high scratch resistance, low surface friction and enhanced anti-blocking performance and is therefore the preferred choice for discontinuous innerlayer manufacturing processes.

Liquid Photoimagable Etch Resist, Features and Benefits

		Ultra high contrast for sharpest definition
		Homogeneous film formation allowing perfect hard contact at exposure
		Rapid exposure, within a wide exposure tolerance, allowing low energy at exposure, ease of frame cooling and thereby highest registration accuracy
		A hard and tough exposed film, able to withstand the rigors of DES transport and handling
		Rapid developing in short chambers within widest process tolerance achieving fine line structuring with minimized process investments
		Endless resistance to acid etchants without scum formation

For more information about Liquid Photoimageable Etch Resists,
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